Enea Extreme Ultraviolet Lithography Micro-Exposure Tool Main Features

After the introduction, the main features of the ENEA MET components are synthesized in Sect. 2. Indeed, following the radiation path, we will highlight the characteristics of the source, the DMS, the collector, the mask illuminating mirrors, and the imaging optics. Emphasis will be put on the latter, the SO design, mounting and alignment being described in detail. Section 3 gives an account of the successful operation of the device, reported in,¹ and of the SO transmission measurement, subsequently carried out in order to identify the cause of the unexpectedly poor performance (as regards the overall reflectivity) of the objective. Concluding notes are given in Sect. 4.