Skip to Main Content
Skip Nav Destination

Laser-plasma gas-puff target sources suitable for EUV and SXR microscopy have been presented. Microscopy with Fresnel zone plates, due to their high dispersion, requires monochromatic radiation, which to a good approximation is the quasi-monochromatic emission from an argon based EUV source at 13.84 nm. This source was used for microscopy experiments and provided a spatial resolution of about 50 nm. Similarly a nitrogen based source can be used for SXR microscopy with the same type of optic. An argon based SXR source offers much higher photon flux through the broadband emission and, although not suitable for zone plate objectives, were employed in SXR microscopes with reflective, dispersion-free optics such as Wolter type I objectives.

This content is only available via PDF.
You do not currently have access to this chapter, but see below options to check access via your institution or sign in to purchase.
Don't already have an account? Register
Close Modal

or Create an Account

Close Modal
Close Modal