Chemical Vapour Deposition: Precursors, Processes and Applications
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book. The book has been written with CVD practitioners in mind, such as the chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. The volume will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level.
Chemical Vapour Deposition: Precursors, Processes and Applications, The Royal Society of Chemistry, 2008.
Download citation file:
Digital access
Print format
Table of contents
-
Overview of Chemical Vapour Depositionp1-36ByAnthony C. Jones;Anthony C. JonesDepartment of Chemistry, University of Liverpool, Crown StreetLiverpoolL69 7ZDUKSearch for other works by this author on:Michael L. HitchmanMichael L. HitchmanThin Film Innovations Ltd.Block 7Kelvin CampusWest of Scotland Science ParkGlasgowG20 0THUKSearch for other works by this author on:
-
Chapter 2: CVD Reactors and Delivery System Technologyp37-92BySusan P. KrumdieckSusan P. KrumdieckDepartment of Mechanical Engineering, University of CanterburyPrivate Bag 4800Christchurch 8014New ZealandSearch for other works by this author on:
-
Chapter 3: Modeling CVD Processesp93-157ByMark D. Allendorf;Mark D. AllendorfSandia National LaboratoriesPO Box 969 MS 9291LivermoreCA 94551-0969USASearch for other works by this author on:Theodore. M. Besmann;Theodore. M. BesmannOak Ridge National LaboratoryPO Box 2008 MS 6063Oak RidgeTN 37831-6063USASearch for other works by this author on:Robert J. Kee;Robert J. KeeDivision of EngineeringColorado School of MinesGoldenCO 80401USASearch for other works by this author on:Mark T. SwihartMark T. SwihartDepartment of Chemical and Biological EngineeringState University of New YorkBuffaloNY 14260-4200USASearch for other works by this author on:
-
Chapter 4: Atomic Layer Depositionp158-206ByMikko Ritala;Mikko RitalaLaboratory of Inorganic Chemistry, University of HelsinkiP.O. Box 55HelsinkiFI-00014FinlandSearch for other works by this author on:Jaakko NiinistöJaakko NiinistöLaboratory of Inorganic Chemistry, University of HelsinkiP.O. Box 55HelsinkiFI-00014FinlandSearch for other works by this author on:
-
Chapter 5: Basic Chemistry of CVD and ALD Precursorsp207-271ByMohammad Azad Malik;Mohammad Azad MalikSchool of Chemistry, The University of ManchesterOxford RoadManchesterM13 9PLUKSearch for other works by this author on:Paul O’brienPaul O’brienSchool of Chemistry, The University of ManchesterOxford RoadManchesterM13 9PLUKSearch for other works by this author on:
-
Chapter 6: CVD of III-V Compound Semiconductorsp272-319ByJae-Hyun Ryou;Jae-Hyun RyouCenter for Compound Semiconductors and School of Electrical and Computer EngineeringGeorgia Institute of Technology777 Atlantic Dr. NWAtlantaGA 30332-0250USASearch for other works by this author on:Ravi Kanjolia;Ravi KanjoliaSAFC Hitech1429 Hilldale AvenueHaverhillMA 01832USASearch for other works by this author on:Russell D. DupuisRussell D. DupuisCenter for Compound Semiconductors, School of Electrical and Computer Engineering, School of Materials Science and EngineeringGeorgia Institute of Technology777 Atlantic Dr. NWAtlantaGA 30332-0250USASearch for other works by this author on:
-
Chapter 7: Chemical Vapor Deposition of Metals: W, Al, Cu and Rup320-356ByBing Luo;Bing LuoDepartment of Chemistry, University of MinnesotaMinneapolisMN 55455USASearch for other works by this author on:Wayne L. GladfelterWayne L. GladfelterDepartment of Chemistry, University of MinnesotaMinneapolisMN 55455USASearch for other works by this author on:
-
Chapter 8: Chemical Vapour Deposition of Metal Oxides for Microelectronics Applicationsp357-412ByAnthony C. Jones;Anthony C. JonesDepartment of Chemistry, University of LiverpoolCrown StreetLiverpoolL69 7ZDUKSearch for other works by this author on:Helen C. Aspinall;Helen C. AspinallDepartment of Chemistry, University of LiverpoolCrown StreetLiverpoolL69 7ZDUKSearch for other works by this author on:Paul R. ChalkerPaul R. ChalkerDepartment of Engineering, University of LiverpoolLiverpoolL69 3BXUKSearch for other works by this author on:
-
Chapter 9: Metal-organic Chemical Vapour Deposition of Refractory Transition Metal Nitridesp413-450ByRoland A. Fischer;Roland A. FischerLehrstuhl für Anorganische Chemie IIOrganometallics and MaterialsRuhr-Universität BochumUniversitätsstr15044801 BochumGermanySearch for other works by this author on:Harish ParalaHarish ParalaLehrstuhl für Anorganische Chemie IIOrganometallics and MaterialsRuhr-Universität BochumUniversitätsstr15044801 BochumGermanySearch for other works by this author on:
-
Chapter 10: CVD of Functional Coatings on Glassp451-476ByIvan P. Parkin;Ivan P. ParkinDepartment of Chemistry, University College London20 Gordon StreetLondonWC1H OAJUKSearch for other works by this author on:Robert G. PalgraveRobert G. PalgraveDepartment of Chemistry, University College London20 Gordon StreetLondonWC1H OAJUKSearch for other works by this author on:
-
Chapter 11: Photo-assisted CVDp477-493ByStuart J. C. Irvine;Stuart J. C. IrvineCentre for Solar Energy ResearchOpTIC Technium/NEWI, Ffordd William MorganSE Asaph Business ParkSE Asaph LL17 OJDNorth WalesSearch for other works by this author on:Dan LambDan LambCentre for Solar Energy ResearchOpTIC Technium/NEWI, Ffordd William MorganSE Asaph Business ParkSE Asaph LL17 OJDNorth WalesSearch for other works by this author on:
-
Chapter 12: Plasma Enhanced Chemical Vapour Deposition Processesp494-534BySergei E. Alexandrov;Sergei E. AlexandrovDepartment of Electronic Materials Technology, St Petersburg State Polytechnical UniversityPolytechnical Str 29195 251 St PetersburgRussiaSearch for other works by this author on:Michael L. HitchmanMichael L. HitchmanThin Film Innovations Ltd.Block 7 Kelvin CampusWest of Scotland Science ParkGlasgow G20 0THUKSearch for other works by this author on:
-
Chapter 13: Commercial Aspects of CVDp535-570ByAlbert Barry Leese;Albert Barry LeeseSAFC HitechPower RoadBromboroughWirralCH62 3QFUKSearch for other works by this author on:Alan Rodney MillsAlan Rodney MillsIndependent MarketBusiness & Technology Consultant980 Golden WayLos Altos CA 94024USASearch for other works by this author on:
Spotlight
Advertisement
Advertisement