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Chemical Vapour Deposition: Precursors, Processes and Applications
Hardback ISBN:
978-0-85404-465-8
PDF ISBN:
978-1-84755-879-4
No. of Pages:
600
Published online:
17 Dec 2008
Published in print:
22 Dec 2008
Book Chapter
Chapter 3: Modeling CVD Processes
By
Mark D. Allendorf
;
Mark D. Allendorf
Sandia National Laboratories
PO Box 969 MS 9291
Livermore
CA 94551-0969
USA
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Theodore. M. Besmann
;
Theodore. M. Besmann
Oak Ridge National Laboratory
PO Box 2008 MS 6063
Oak Ridge
TN 37831-6063
USA
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Robert J. Kee
;
Robert J. Kee
Division of Engineering
Colorado School of Mines
Golden
CO 80401
USA
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Mark T. Swihart
Mark T. Swihart
Department of Chemical and Biological Engineering
State University of New York
Buffalo
NY 14260-4200
USA
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Published:17 Dec 2008
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Page range:
93 - 157
Citation
M. D. Allendorf, T. M. Besmann, R. J. Kee, and M. T. Swihart, in Chemical Vapour Deposition: Precursors, Processes and Applications, ed. A. C. Jones and M. L. Hitchman, The Royal Society of Chemistry, 2008, ch. 3, pp. 93-157.
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