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Chemical Vapour Deposition: Precursors, Processes and Applications
Hardback ISBN:
978-0-85404-465-8
PDF ISBN:
978-1-84755-879-4
No. of Pages:
600
Published online:
17 Dec 2008
Published in print:
22 Dec 2008
Book Chapter
Chapter 4: Atomic Layer Deposition
By
Mikko Ritala
;
Mikko Ritala
Laboratory of Inorganic Chemistry, University of Helsinki
P.O. Box 55
Helsinki
FI-00014
Finland
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Jaakko Niinistö
Jaakko Niinistö
Laboratory of Inorganic Chemistry, University of Helsinki
P.O. Box 55
Helsinki
FI-00014
Finland
Search for other works by this author on:
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Published:17 Dec 2008
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Page range:
158 - 206
Citation
M. Ritala and J. Niinistö, in Chemical Vapour Deposition: Precursors, Processes and Applications, ed. A. C. Jones and M. L. Hitchman, The Royal Society of Chemistry, 2008, ch. 4, pp. 158-206.
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