Skip Nav Destination
Chemical Vapour Deposition: Precursors, Processes and Applications
Hardback ISBN:
978-0-85404-465-8
PDF ISBN:
978-1-84755-879-4
No. of Pages:
600
Published online:
17 Dec 2008
Published in print:
22 Dec 2008
Book Chapter
Chapter 6: CVD of III-V Compound Semiconductors
By
Jae-Hyun Ryou
;
Jae-Hyun Ryou
Center for Compound Semiconductors and School of Electrical and Computer Engineering
Georgia Institute of Technology
777 Atlantic Dr. NW
Atlanta
GA 30332-0250
USA
Search for other works by this author on:
Ravi Kanjolia
;
Ravi Kanjolia
SAFC Hitech
1429 Hilldale Avenue
Haverhill
MA 01832
USA
Search for other works by this author on:
Russell D. Dupuis
Russell D. Dupuis
Center for Compound Semiconductors, School of Electrical and Computer Engineering, School of Materials Science and Engineering
Georgia Institute of Technology
777 Atlantic Dr. NW
Atlanta
GA 30332-0250
USA
Search for other works by this author on:
-
Published:17 Dec 2008
-
Page range:
272 - 319
Citation
J. Ryou, R. Kanjolia, and R. D. Dupuis, in Chemical Vapour Deposition: Precursors, Processes and Applications, ed. A. C. Jones and M. L. Hitchman, The Royal Society of Chemistry, 2008, ch. 6, pp. 272-319.
Download citation file:
You do not currently have access to this chapter, but see below options to check access via your institution or sign in to purchase.
Digital access
$64.60
