Skip to Main Content
Umbrella Alt Text
header search
Search
(0)
Skip Nav Destination
Chemical Vapour Deposition: Precursors, Processes and Applications
Chemical Vapour Deposition: Precursors, Processes and Applications
Edited by
Anthony C Jones
Anthony C Jones
Search for other works by this author on:
This Site
PubMed
Google Scholar
Michael L Hitchman
Michael L Hitchman
Search for other works by this author on:
This Site
PubMed
Google Scholar
DOI:
https://doi.org/10.1039/9781847558794
Hardback ISBN:
978-0-85404-465-8
PDF ISBN:
978-1-84755-879-4
No. of Pages:
600
Published online:
17 Dec 2008
Published in print:
22 Dec 2008
Book Chapter

Chapter 7: Chemical Vapor Deposition of Metals: W, Al, Cu and Ru

By
Bing Luo
Bing Luo
Department of Chemistry, University of Minnesota
Minneapolis
MN 55455
USA
Search for other works by this author on:
This Site
PubMed
Google Scholar
;
Wayne L. Gladfelter
Wayne L. Gladfelter
Department of Chemistry, University of Minnesota
Minneapolis
MN 55455
USA
Search for other works by this author on:
This Site
PubMed
Google Scholar
Doi:
https://doi.org/10.1039/9781847558794-00320
Page range:
320 - 356

First Page Preview

First page PDF preview
You do not currently have access to this chapter, but see below options to check access via your institution or sign in to purchase.
Don't already have an account? Register

Digital access

$64.60
Close Modal
This Feature Is Available To Subscribers Only

or Create an Account

Close Modal
Close Modal