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Chemical Vapour Deposition: Precursors, Processes and Applications
Hardback ISBN:
978-0-85404-465-8
PDF ISBN:
978-1-84755-879-4
No. of Pages:
600
Published online:
17 Dec 2008
Published in print:
22 Dec 2008
Book Chapter
Chapter 8: Chemical Vapour Deposition of Metal Oxides for Microelectronics Applications
By
Anthony C. Jones
;
Anthony C. Jones
Department of Chemistry, University of Liverpool
Crown Street
Liverpool
L69 7ZD
UK
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Helen C. Aspinall
;
Helen C. Aspinall
Department of Chemistry, University of Liverpool
Crown Street
Liverpool
L69 7ZD
UK
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Paul R. Chalker
Paul R. Chalker
Department of Engineering, University of Liverpool
Liverpool
L69 3BX
UK
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Published:17 Dec 2008
-
Page range:
357 - 412
Citation
A. C. Jones, H. C. Aspinall, and P. R. Chalker, in Chemical Vapour Deposition: Precursors, Processes and Applications, ed. A. C. Jones and M. L. Hitchman, The Royal Society of Chemistry, 2008, ch. 8, pp. 357-412.
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