Skip Nav Destination
Chemical Vapour Deposition: Precursors, Processes and Applications
Hardback ISBN:
978-0-85404-465-8
PDF ISBN:
978-1-84755-879-4
No. of Pages:
600
Published online:
17 Dec 2008
Published in print:
22 Dec 2008
Book Chapter
Chapter 12: Plasma Enhanced Chemical Vapour Deposition Processes
By
Sergei E. Alexandrov
;
Sergei E. Alexandrov
Department of Electronic Materials Technology, St Petersburg State Polytechnical University
Polytechnical Str 29
195 251 St Petersburg
Russia
Search for other works by this author on:
Michael L. Hitchman
Michael L. Hitchman
Thin Film Innovations Ltd.
Block 7 Kelvin Campus
West of Scotland Science Park
Glasgow G20 0TH
UK
Search for other works by this author on:
-
Published:17 Dec 2008
-
Page range:
494 - 534
Citation
S. E. Alexandrov and M. L. Hitchman, in Chemical Vapour Deposition: Precursors, Processes and Applications, ed. A. C. Jones and M. L. Hitchman, The Royal Society of Chemistry, 2008, ch. 12, pp. 494-534.
Download citation file:
You do not currently have access to this chapter, but see below options to check access via your institution or sign in to purchase.
Digital access
$64.60