Chapter 5: Chemical Vapor Deposition of Porphyrins
Published:10 Aug 2021
N. D. Boscher, G. Bengasi, and K. Heinze, in Applications of Porphyrinoids as Functional Materials, ed. H. Lang and T. Rueffer, The Royal Society of Chemistry, 2021, ch. 5, pp. 121-148.
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Chemical vapor deposition (CVD) provides a versatile solution for the preparation and integration of high-quality thin films for a broad range of applications. CVD has only recently been combined with the richness of porphyrin chemistry to create a new generation of porphyrin-based thin films for sensing, catalysis, and optoelectronics. This chapter reports the recent progress made in the plasma-polymerization, free-radical polymerization and dehydrogenative coupling of porphyrins via CVD. The influences of the CVD conditions and porphyrin features on the chemical, morphological, and functional properties of the resulting thin films are discussed.