12: Generation of Nanostructures I: Top-down Approaches Check Access
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Published:10 May 2024
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Product Type: Textbooks
Introduction to Nanoengineering, Royal Society of Chemistry, 2024, pp. 273-307.
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Chapter 12 introduces a diverse range of top-down nanofabrication processes, emphasizing the significance of mastering and replication in creating intricate patterns within microprocessors. The chapter introduces the fundamental concepts of thin-film deposition and how they play a crucial role in the semiconductor industry. It elaborates on various patterning techniques used in the production of microchips, with a specific focus on the use of resist films as a stencil mask. The chapter concludes with a discussion on unconventional lithography methods, such as using beams of charged particles and physical contact, to enhance manufacturing precision and efficiency.